[ sulge aken ]
| Elulookirjeldus (CV) | ||
| 1. | Eesnimi | Aarne |
| 2. | Perekonnanimi | Kasikov |
| 3. | Töökoht | Tartu Ülikooli Füüsika Instituut |
| 4. | Ametikoht | Laseroptika sektori juhataja |
| 5. | Sünniaeg | 22.04.1957 (päev.kuu.aasta) |
| 6. | Haridus | Kõrgem, Tartu Riiklik Ülikool 1979, füüsik, füüsik-pedagoog |
| 7. | Teenistuskäik | ENSV TA FI, insener, 1979-80 12. Kaardiväe motolaskurpolk, Gvardejsk, rühmakomandör, 1980-83 ENSV TA FI, vaneminsener, 1983-85 ENSV TA FI, nooremteadur, 1985-90 ENSV TA FI, sektorijuhataja, 1990- |
| 8. | Teaduskraad | MSc |
| 9. | Teaduskraadi välja andnud asutus, aasta |
Tartu Ülikool, 1995 |
| 10. | Tunnustused | |
| 11. | Teadusorganisatsiooniline ja –administratiivne tegevus |
Eesti Füüsika Selts, liige |
| 12. | Juhendamisel kaitstud väitekirjad |
|
| 13. | Teadustöö põhisuunad | Optiliste katete valmistamine, vaakumaurustus, õhukeste kilede optiliste parameetrite määramine, õhukeste kilede struktuur |
| 14. | Jooksvad grandid | |
| 15. | Teaduspublikatsioonid |
A.Tarre, A.Rosental, T.Uustare, A.Kasikov "SnO2 on Sapphire. Amorphous, Polycrystalline and Epitaxial Films". In: Proc. of SPIE, vol.5946 "Optical Materials and Applications", Editor: Arnold Rosental, pp.128-134, 2005. F.A.Savichin, A.Kasikov "A New Look at the Formation of Old Believer Communities in the Western Prichud'e of Estonia ( on the Basis of Historical and Linguistic Data )" ( in Russian ), Russian Linguistics, 29, 2, 137-187, 2005 J.Aarik, A.Kasikov, M.Kirm, S.Lange, T.Uustare, H.Mändar "Optical properties of crystalline Al2O3 thin films grown by atomic layer deposition". In: Proc. of SPIE, vol.5946 "Optical Materials and Applications", Editor: Arnold Rosental, pp.1-10, 2005 A.Kasikov, "LaF3 as a high-index material in VUV," in Optical Organic and Inorganic Materials, Steponas P.As'montas, Jonas Gradauskas, Editors, Proceedings of SPIE Vol. 4415, 110-114 (2001) A.Niilisk, A.Rosental, T.Uustare, A.Kasikov "Chloride Atomic-Layer Chemical Vapor deposition of TiO2 with Chloride Pretreatment of Substrates", J.de Physique IV, 11, 103-107, 2001 A.Niilisk, A.Rosental, A.Gerst, A.Tarre, A.Kasikov, V.Sammelselg, T.Uustare "TiO2 Thin Films by Atomic-Layer Chemical Vapor Deposition: Growth at 365oC". In: Proc.Int.Conf. on Thin Film Deposition of Oxide Multilayers. Industrial-Scale Processing. TFDOM. ( Vilnius, Lithuania, Sept. 28-29, 2000 ), ed. by B.Vengalis and A.Abrutis. Vilnius Univ. Press, pp.61-65, 2000 A.Rosental, A.Tarre, P.Adamson, A.Gerst, A.Kasikov, A.Niilisk "Surface of TiO2 during atomic layer deposition as determined by incremental dielectric reflection", Applied Surface Science, 142, 204-209, 1999 V.Sammelselg, J.Aarik, A.Aidla, A.Kasikov, E.Heikinheimo, M.Peussa and L.Niinistõ "Composition and thickness determination of thin oxide films: comparison of different programs and methods", Journal of Analytic Atomic Spectrometry, 14, 523-527, 1999 J.Männik, J.Aarik, I.Sildos, A.Kasikov, and A.Aidla "Spectroscopic Study of Thin Titanium Dioxide Films Grown by Atomic Layer Deposition", Eesti TA Toim.Füüs.Matem., 47, 1, 56-62, 1998 A.Kasikov, A.S.Kuznetsov "Aging of evaporated MgF2 described by various number of parameters". In: "Optical Inorganic Dielectric Materials and Devices", Andris Krumins, Donats K.Millers, A.Sternberg, Janis Spigulis, Editors, Proc.SPIE. SPIE, Bellingham 2967, pp.237-241, 1997 A.Kasikov and A.S.Kuznetsov "Model of inhomogeneity for an evaporated MgF2 layer on quartz", J.Phys.D:Appl.Phys., 27, 1994, 2470-2474 Е.Берик, В.Давыденко, А.Касиков ,,Увеличение пропускания внутрирезонаторного расширителя пучка во всем видимом диапазоне спектра". Eesti TA Toim.Füüs.Matem., 40, 1, 1991, 45-48 H.Kasikov, A.Kasikov ,,Еще раз о Рюрике Новгородском и Рорике Датчанине". В: ,,Скандинавский сборник" т.XXIII, Таллинн 1990, с.98-109 |
viimati muudetud: 06.10.2005
| Curriculum Vitae (CV) | ||
| 1. | First Name | Aarne |
| 2. | Surname | Kasikov |
| 3. | Institution | Institute of Physics, Univerity of Tartu |
| 4. | Position | Section Head, Laser Optics |
| 5. | Date of birth | 22.04.1957 (day.month.year) |
| 6. | Education | Tartu State University, 1979, physicist |
| 7. | Research and professional experience |
Ingenieur, Ac.Sci.ESSR, 1979-80 Platoon Commander, 12. Guard Motorized Rifle Regiment, Gvardejsk, 1980-83 Senior ingenieur, Ac.Sci.ESSR, 1983-85 Junior Researcher, Ac.Sci.ESSR, 1985-90 Section Head, Ac.Sci.ESSR, 1990- |
| 8. | Academic degree | MSc |
| 9. | Dates and sites of earning the degrees |
University of Tartu, 1995 |
| 10. | Honours/awards | |
| 11. | Research-administrative experience |
Estonian Physical Society, member |
| 12. | Supervised dissertations | |
| 13. | Current research program | Production of optical coatings, vacuum evaporation, evaluation of thin film optical parameters, structure of thin films |
| 14. | Current grant funding | |
| 15. | List of most important publications |
A.Tarre, A.Rosental, T.Uustare, A.Kasikov "SnO2 on Sapphire. Amorphous, Polycrystalline and Epitaxial Films". In: Proc. of SPIE, vol.5946 "Optical Materials and Applications", Editor: Arnold Rosental, pp.128-134, 2005. F.A.Savichin, A.Kasikov "A New Look at the Formation of Old Believer Communities in the Western Prichud'e of Estonia ( on the Basis of Historical and Linguistic Data )" ( in Russian ), Russian Linguistics, 29, 2, 137-187, 2005 J.Aarik, A.Kasikov, M.Kirm, S.Lange, T.Uustare, H.Mändar "Optical properties of crystalline Al2O3 thin films grown by atomic layer deposition". In: Proc. of SPIE, vol.5946 "Optical Materials and Applications", Editor: Arnold Rosental, pp.1-10, 2005 A.Kasikov, "LaF3 as a high-index material in VUV," in Optical Organic and Inorganic Materials, Steponas P.As'montas, Jonas Gradauskas, Editors, Proceedings of SPIE Vol. 4415, 110-114 (2001) A.Niilisk, A.Rosental, T.Uustare, A.Kasikov "Chloride Atomic-Layer Chemical Vapor deposition of TiO2 with Chloride Pretreatment of Substrates", J.de Physique IV, 11, 103-107, 2001 A.Niilisk, A.Rosental, A.Gerst, A.Tarre, A.Kasikov, V.Sammelselg, T.Uustare "TiO2 Thin Films by Atomic-Layer Chemical Vapor Deposition: Growth at 365oC". In: Proc.Int.Conf. on Thin Film Deposition of Oxide Multilayers. Industrial-Scale Processing. TFDOM. ( Vilnius, Lithuania, Sept. 28-29, 2000 ), ed. by B.Vengalis and A.Abrutis. Vilnius Univ. Press, pp.61-65, 2000 A.Rosental, A.Tarre, P.Adamson, A.Gerst, A.Kasikov, A.Niilisk "Surface of TiO2 during atomic layer deposition as determined by incremental dielectric reflection", Applied Surface Science, 142, 204-209, 1999 V.Sammelselg, J.Aarik, A.Aidla, A.Kasikov, E.Heikinheimo, M.Peussa and L.Niinistõ "Composition and thickness determination of thin oxide films: comparison of different programs and methods", Journal of Analytic Atomic Spectrometry, 14, 523-527, 1999 J.Männik, J.Aarik, I.Sildos, A.Kasikov, and A.Aidla "Spectroscopic Study of Thin Titanium Dioxide Films Grown by Atomic Layer Deposition", Eesti TA Toim.Füüs.Matem., 47, 1, 56-62, 1998 A.Kasikov, A.S.Kuznetsov "Aging of evaporated MgF2 described by various number of parameters". In: "Optical Inorganic Dielectric Materials and Devices", Andris Krumins, Donats K.Millers, A.Sternberg, Janis Spigulis, Editors, Proc.SPIE. SPIE, Bellingham 2967, pp.237-241, 1997 A.Kasikov and A.S.Kuznetsov "Model of inhomogeneity for an evaporated MgF2 layer on quartz", J.Phys.D:Appl.Phys., 27, 1994, 2470-2474 Е.Берик, В.Давыденко, А.Касиков ,,Увеличение пропускания внутрирезонаторного расширителя пучка во всем видимом диапазоне спектра". Eesti TA Toim.Füüs.Matem., 40, 1, 1991, 45-48 H.Kasikov, A.Kasikov ,,Еще раз о Рюрике Новгородском и Рорике Датчанине". В: ,,Скандинавский сборник" т.XXIII, Таллинн 1990, с.98-109 |
last updated: 06.10.2005
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